Keywords: Locos (microtechnology) process.svg The image illustrates the LOCOS technology used in microfabrication mostly to create isolating structures I Preparation of silicon substrate II CVD deposition of SiO2 pad/buffer oxide III CVD deposition of Si3N4 nitride mask IV Etching of nitride layer and silicon oxide layer V Thermal growth of silicon oxide VI Furhter growth of thermal silicon oxide VII Removal of nitride mask 1 Si silicon substrate 2 SiO2 pad/buffer oxide chemical vapor deposition silicon oxide 3 Si3N4 nitride mask 4 SiO2 isolation oxide thermal oxide Own 2008-01-19 Twisp Thermal oxidation SVG microtechnology Chemical vapour deposition |